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    Plasma Science and Technology - Progress in Physical States and Chemical Reactions

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    Contributor(s)
    Mieno, Tetsu (editor)
    Language
    English
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    Abstract
    In the early twentieth century, Dr. Irving Langmuir actively studied plasma discharge and surface science. Since then, great progress has been made in the development of applications of discharges and plasmas such as discharge lamps, electric tubes, and arc welding. In relation to studies on space physics and controlled nuclear fusion, plasma physics has greatly advanced. Plasma chemistry has also progressed along with its applications in LSI fabrication technology, the chemical vapor deposition of functional films, and the production of nanomaterials. In the twenty-first century, the further development of applications of plasma physics and plasma chemistry is certainly expected. In this book, 18 chapters on the recent progress in plasma science and technology have been written by active specialists worldwide.
    URI
    http://library.oapen.org/handle/20.500.12657/32357
    Keywords
    plasma science; technology
    DOI
    10.5772/60692
    ISBN
    9789535122807
    OCN
    1030823023
    Publisher
    InTechOpen
    Publisher website
    https://www.intechopen.com/
    Publication date and place
    2016
    Classification
    Science: general issues
    Pages
    574
    Chapters in this book
    • Chapter 8 Non-thermal Plasma Technology for the Improvement of Scaffolds for Tissue Engineering and Regenerative Medicine - A Review
    Rights
    • Imported or submitted locally

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    License

    • If not noted otherwise all contents are available under Attribution 4.0 International (CC BY 4.0)

    Credits

    • logo EU
    • This project received funding from the European Union's Horizon 2020 research and innovation programme under grant agreement No 683680, 810640, 871069 and 964352.

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