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dc.contributor.editorMieno, Tetsu
dc.date.accessioned2016-12-31 23:55:55
dc.date.accessioned2019-10-04 14:18:25
dc.date.accessioned2020-04-01T14:07:10Z
dc.date.available2020-04-01T14:07:10Z
dc.date.issued2016
dc.identifier612530
dc.identifierOCN: 1030823023en_US
dc.identifier.urihttp://library.oapen.org/handle/20.500.12657/32357
dc.description.abstractIn the early twentieth century, Dr. Irving Langmuir actively studied plasma discharge and surface science. Since then, great progress has been made in the development of applications of discharges and plasmas such as discharge lamps, electric tubes, and arc welding. In relation to studies on space physics and controlled nuclear fusion, plasma physics has greatly advanced. Plasma chemistry has also progressed along with its applications in LSI fabrication technology, the chemical vapor deposition of functional films, and the production of nanomaterials. In the twenty-first century, the further development of applications of plasma physics and plasma chemistry is certainly expected. In this book, 18 chapters on the recent progress in plasma science and technology have been written by active specialists worldwide.
dc.languageEnglish
dc.subject.classificationthema EDItEUR::P Mathematics and Science::PD Science: general issuesen_US
dc.subject.otherplasma science
dc.subject.othertechnology
dc.titlePlasma Science and Technology - Progress in Physical States and Chemical Reactions
dc.typebook
oapen.identifier.doi10.5772/60692
oapen.relation.isPublishedBy09f6769d-48ed-467d-b150-4cf2680656a1
oapen.relation.hasChapter1d272927-04a1-49e8-b402-17d763867fef
oapen.relation.isbn9789535122807
oapen.pages574
oapen.identifier.ocn1030823023


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